| Description | Make | Model |
|---|---|---|
| Semiconductor Fabrication | ||
| PECVD (Plasma Enhanced Chemical Vapor Deposition), APF (Advanced Patterning Film), 300mm, 3 twin APF chambers, strippable amorphous carbon hard mask technology for critical patterning steps, 2005 vintage crated | Applied Materials, Inc | Producer SE APF |
| RTP (Rapid Thermal Processing), 300mm, 3 FOUP loader, dual chamber platform. 2005 vintage crated | Mattson Technology | Helios ® |